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Nuno Pessoa Barradas
AuthID:
R-000-DV0
Publications
Confirmed
To Validate
Document Source:
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Document Type:
All Document Types
Article (230)
Proceedings Paper (28)
Review (2)
Erratum (1)
Correction (1)
Letter (1)
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Order:
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Cit. WOS Dsc
IF WOS Dsc
Cit. Scopus Dsc
IF Scopus Dsc
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Confirmed Publications: 263
221
TITLE:
Growth of microcrystalline beta-SiC films on silicon by ECR plasma CVD
Full Text
AUTHORS:
Toal, SJ;
Reehal, HS
;
Barradas, NP
;
Jeynes, C
;
PUBLISHED:
1999
,
SOURCE:
Symposium on Surface Processing - Laser, Lamp, Plasma, at the Annual Spring Meeting of the European-Materials-Society (E-MRS 96)
in
APPLIED SURFACE SCIENCE,
VOLUME:
138,
ISSUE:
1-4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
222
TITLE:
High-depth-resolution Rutherford backscattering data and error analysis of SiGe systems using the simulated annealing and Markov chain Monte Carlo algorithms
AUTHORS:
Barradas, NP
; Knights, AP;
Jeynes, C
; Mironov, OA;
Grasby, TJ
; Parker, EHC;
PUBLISHED:
1999
,
SOURCE:
PHYSICAL REVIEW B,
VOLUME:
59,
ISSUE:
7
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
223
TITLE:
Processing and characterisation of sol-gel deposited Ta2O5 and TiO2-Ta2O5 dielectric thin films
Full Text
AUTHORS:
Cappellani, A; Keddie, JL;
Barradas, NP
; Jackson, SM;
PUBLISHED:
1999
,
SOURCE:
Symposium on Materials and Processes for Submicron Technologies, at the E-MRS Spring Meeting
in
SOLID-STATE ELECTRONICS,
VOLUME:
43,
ISSUE:
6
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
224
TITLE:
Rapid accurate automated analysis of complex ion beam analysis data
AUTHORS:
Marriott, PK; Jenkin, M;
Jeynes, C
;
Barradas, NP
; Webb, RP; Sealy, BJ;
PUBLISHED:
1999
,
SOURCE:
15th International Conference on the Application of Accelerators in Research and Industry
in
APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2,
VOLUME:
475
INDEXED IN:
WOS
IN MY:
ResearcherID
225
TITLE:
RBS/simulated annealing and FTIR characterisation of BCN films deposited by dual cathode magnetron sputtering
AUTHORS:
Barradas, NP
;
Jeynes, C
; Kusano, Y;
Evetts, JE
; Hutchings, IM;
PUBLISHED:
1999
,
SOURCE:
15th International Conference on the Application of Accelerators in Research and Industry
in
APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2,
VOLUME:
475
INDEXED IN:
WOS
IN MY:
ResearcherID
226
TITLE:
RES and ERDA study of ion beam synthesised amorphous gallium nitride
Full Text
AUTHORS:
Barradas, NP
; Almeida, SA;
Jeynes, C
; Knights, AP; Silva, SRP; Sealy, BJ;
PUBLISHED:
1999
,
SOURCE:
11th International Conference on Ion Beam Modification of Materials (IBMM98)
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
148,
ISSUE:
1-4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
227
TITLE:
Self ion irradiated Si probed with enhanced depth resolution positron annihilation spectroscopy
Full Text
AUTHORS:
Knights, AP; Nejim, A;
Barradas, NP
; Coleman, PG;
PUBLISHED:
1999
,
SOURCE:
11th International Conference on Ion Beam Modification of Materials (IBMM98)
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
148,
ISSUE:
1-4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
228
TITLE:
Simulated annealing analysis of nuclear reaction analysis measurements of polystyrene systems
AUTHORS:
Barradas, NP
; Smith, R;
PUBLISHED:
1999
,
SOURCE:
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
VOLUME:
32,
ISSUE:
22
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
229
TITLE:
Structural analysis of nanocrystalline SiC thin films grown on silicon by ECR plasma CVD
Full Text
AUTHORS:
Toal, SJ;
Reehal, HS
;
Webb, SJ
;
Barradas, NP
;
Jeynes, C
;
PUBLISHED:
1999
,
SOURCE:
14th International Vacuum Congress/10th International Conference on Solid Surfaces/5th International Conference on Nanometre-Scale Science and Technology/10th International Conference on Quantitative Surface Analysis
in
THIN SOLID FILMS,
VOLUME:
343,
ISSUE:
1-2
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
230
TITLE:
The influence of implantation and annealing conditions on optical activity of Er3+ ions in 6H SiC
Full Text
AUTHORS:
Kozanecki, A;
Jeynes, C
;
Barradas, NP
; Sealy, BJ; Jantsch, W;
PUBLISHED:
1999
,
SOURCE:
11th International Conference on Ion Beam Modification of Materials (IBMM98)
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
148,
ISSUE:
1-4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
|
ResearcherID
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