91
TITLE: Information entropy and particle production in branching processes
AUTHORS: Brogueira, P ; deDeus, JD ; daSilva, IP ;
PUBLISHED: 1996, SOURCE: PHYSICAL REVIEW D, VOLUME: 53, ISSUE: 9
INDEXED IN: Scopus WOS CrossRef
92
TITLE: Photoconductive analysis of defect density of hydrogenated amorphous silicon during room-temperature plasma posthydrogenation, light soaking, and thermal annealing
AUTHORS: Condo, JP ; Goncalves, M; Brogueira, P ; Schotten, V; Chu, V ;
PUBLISHED: 1996, SOURCE: PHYSICAL REVIEW B, VOLUME: 53, ISSUE: 4
INDEXED IN: Scopus WOS
93
TITLE: The influence of hydrogen dilution and substrate temperature in hot-wire deposition of amorphous and microcrystalline silicon with filament temperatures between 1900 and 2500 degrees C
AUTHORS: Conde, JP ; Brogueira, P ; Castanha, R; Chu, V ;
PUBLISHED: 1996, SOURCE: 14th Symposium on Amorphous Silicon Technology, at the 1996 MRS Spring Meeting in AMORPHOUS SILICON TECHNOLOGY - 1996, VOLUME: 420
INDEXED IN: Scopus WOS
94
TITLE: Amorphous-to-microcrystalline silicon transition in hot-wire chemical vapor deposition
AUTHORS: Brogueira, P ; Chu, V; Conde, JP ;
PUBLISHED: 1995, SOURCE: Proceedings of the 1995 MRS Spring Meeting in Materials Research Society Symposium - Proceedings, VOLUME: 377
INDEXED IN: Scopus
IN MY: ORCID
95
TITLE: LOW FILAMENT TEMPERATURE DEPOSITION OF A-SI-H BY HOT-WIRE CHEMICAL-VAPOR-DEPOSITION  Full Text
AUTHORS: BROGUEIRA, P ; CONDE, JP ; AREKAT, S; CHU, V ;
PUBLISHED: 1995, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 78, ISSUE: 6
INDEXED IN: Scopus WOS
96
TITLE: Optoelectronic properties of high-gap amorphous silicon-carbon alloys
AUTHORS: Chu, V; Conde, JP ; Brogueira, P ; Micaelo, P; Jarego, JP; da Silva, MF; Soares, JC ;
PUBLISHED: 1995, SOURCE: Proceedings of the 1995 MRS Spring Meeting in Materials Research Society Symposium - Proceedings, VOLUME: 377
INDEXED IN: Scopus
IN MY: ORCID
97
TITLE: TRANSPORT AND PHOTOLUMINESCENCE OF HYDROGENATED AMORPHOUS SILICON-CARBON ALLOYS  Full Text
AUTHORS: CHU, V ; CONDE, JP ; JAREGO, J; BROGUEIRA, P ; RODRIGUEZ, J; BARRADAS, N ; SOARES, JC ;
PUBLISHED: 1995, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 78, ISSUE: 5
INDEXED IN: Scopus WOS
98
TITLE: LOW FILAMENT TEMPERATURE DEPOSITION OF A-SI-H BY CATALYTIC CHEMICAL-VAPOR-DEPOSITION
AUTHORS: BROGUEIRA, P ; GREBNER, S; WANG, F; SCHWARZ, R ; CHU, V ; CONDE, JP ;
PUBLISHED: 1993, SOURCE: Symposium on Amorphous Silicon Technology, at the 1993 MRS Spring Meeting of the Materials-Research-Society in AMORPHOUS SILICON TECHNOLOGY-1993, VOLUME: 297
INDEXED IN: Scopus WOS
Page 10 of 10. Total results: 98.