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Virginia Chu
AuthID:
R-000-HJ2
Publications
Confirmed
To Validate
Document Source:
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Document Type:
All Document Types
Article (108)
Proceedings Paper (42)
Editorial Material (1)
Review (1)
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Confirmed Publications: 152
131
TITLE:
(p,p) non-Rutherford backscattering analysis of silicon carbide
Full Text
AUTHORS:
Dai, Z;
Soares, JC
; Silva, MF;
Chu, V
;
PUBLISHED:
1998
,
SOURCE:
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
142,
ISSUE:
4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
132
TITLE:
Air-gap amorphous silicon thin film transistors
Full Text
AUTHORS:
Boucinha, M;
Chu, V
;
Conde, JP
;
PUBLISHED:
1998
,
SOURCE:
APPLIED PHYSICS LETTERS,
VOLUME:
73,
ISSUE:
4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
133
TITLE:
Mobility-lifetime product in microdoped amorphous silicon deposited by hot-wipe chemical vapor deposition
Full Text
AUTHORS:
Conde, JP
; Castanha, R;
Brogueira, P
;
Chu, V
;
PUBLISHED:
1998
,
SOURCE:
17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17)
in
JOURNAL OF NON-CRYSTALLINE SOLIDS,
VOLUME:
227,
ISSUE:
PART 1
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
134
TITLE:
Photoluminescence of polymer-like amorphous carbon films grown in different plasma reactors
Full Text
AUTHORS:
Bouree, JE; Heitz, T; Godet, C; Drevillon, B;
Conde, JP
;
Chu, V
;
Berberan Santos, MN
;
Fedorov, A
;
PUBLISHED:
1998
,
SOURCE:
17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17)
in
JOURNAL OF NON-CRYSTALLINE SOLIDS,
VOLUME:
227,
ISSUE:
PART 1
INDEXED IN:
Scopus
WOS
IN MY:
ORCID
135
TITLE:
Wide band gap a-SiC : H films for optoelectronic applications
Full Text
AUTHORS:
Giorgis, F; Giuliani, F; Pirri, CF; Tresso, E;
Conde, JP
;
Chu, V
;
PUBLISHED:
1998
,
SOURCE:
17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17)
in
JOURNAL OF NON-CRYSTALLINE SOLIDS,
VOLUME:
227,
ISSUE:
PART 1
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
136
TITLE:
Amorphous and microcrystalline silicon deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition
AUTHORS:
Conde, JP
; Schotten, V;
Arekat, S
;
Brogueira, P
;
Sousa, R
;
Chu, V
;
PUBLISHED:
1997
,
SOURCE:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
VOLUME:
36,
ISSUE:
1A
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
137
TITLE:
Amorphous and microcrystalline silicon films obtained by hot-wire chemical vapour deposition using high filament temperatures between 1900 and 2500 degrees C
AUTHORS:
Conde, JP
;
Brogueira, P
;
Chu, V
;
PUBLISHED:
1997
,
SOURCE:
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES,
VOLUME:
76,
ISSUE:
3
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
138
TITLE:
Amorphous silicon thin-film transistors with a hot-wire active-layer deposited at high growth rate
AUTHORS:
Chu, V
; Jarego, J; Silva, H; Silva, T; Boucinha, M;
Brogueira, P
;
Conde, JP
;
PUBLISHED:
1997
,
SOURCE:
Symposium on Amorphous and Microcrystalline Silicon Technology
in
AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997,
VOLUME:
467
INDEXED IN:
Scopus
WOS
IN MY:
ORCID
139
TITLE:
Doping of amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition using phosphine and trimethylboron
AUTHORS:
Brogueira, P
;
Chu, V
;
Ferro, AC
;
Conde, JP
;
PUBLISHED:
1997
,
SOURCE:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
VOLUME:
15,
ISSUE:
6
INDEXED IN:
Scopus
WOS
CrossRef
:
27
IN MY:
ORCID
140
TITLE:
Improved mobility of amorphous silicon thin-film transistors deposited by hot-wire chemical vapor deposition on glass substrates
Full Text
AUTHORS:
Chu, V
; Jarego, J; Silva, H;
Silva, T
; Reissner, M;
Brogueira, P
;
Conde, JP
;
PUBLISHED:
1997
,
SOURCE:
APPLIED PHYSICS LETTERS,
VOLUME:
70,
ISSUE:
20
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
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