Rui Miguel dos Santos Martins
AuthID: R-000-J8Z
41
TITLE: The influence of a poly-Si intermediate layer on the crystallization behaviour of Ni-TiSMA magnetron sputtered thin films Full Text
AUTHORS: Martins, RMS; Fernandes, FMB ; Silva, RJC; Pereira, L ; Gordo, PR; Maneira, MJP; Beckers, M; Mucklich, A; Schell, N;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, VOLUME: 83, ISSUE: 1
AUTHORS: Martins, RMS; Fernandes, FMB ; Silva, RJC; Pereira, L ; Gordo, PR; Maneira, MJP; Beckers, M; Mucklich, A; Schell, N;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, VOLUME: 83, ISSUE: 1
IN MY: ORCID | ResearcherID
42
TITLE: Microstructure and nonbasal-plane growth of epitaxial Ti2AlN thin films Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W; Hultman, L;
PUBLISHED: 2006, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 99, ISSUE: 3
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W; Hultman, L;
PUBLISHED: 2006, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 99, ISSUE: 3
IN MY: ORCID | ResearcherID
43
TITLE: Phase stability of epitaxially grown Ti2AlN thin films Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 89, ISSUE: 7
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 89, ISSUE: 7
IN MY: ORCID | ResearcherID
44
TITLE: The influence of the growth rate on the preferred orientation of magnetron-sputtered Ti-Al-N thin films studied by in situ x-ray diffraction Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
IN MY: ORCID | ResearcherID
45
TITLE: Influence of the substrate bias on the size and thermal stability of grains in magnetron-sputtered nanocrystalline Ag films
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
IN MY: ORCID | ResearcherID
46
TITLE: In situ x-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti-Al-N thin films
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 23, ISSUE: 5
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 23, ISSUE: 5
IN MY: ORCID | ResearcherID
47
TITLE: Polycrystalline silicon obtained by metal induced crystallization using different metals Full Text
AUTHORS: Pereira, L ; Aguas, H ; Martins, RMS; Vilarinho, P ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: Symposium on Thin Film and Nano-Structured Materials for Photovoltaics in THIN SOLID FILMS, VOLUME: 451
AUTHORS: Pereira, L ; Aguas, H ; Martins, RMS; Vilarinho, P ; Fortunato, E ; Martins, R ;
PUBLISHED: 2004, SOURCE: Symposium on Thin Film and Nano-Structured Materials for Photovoltaics in THIN SOLID FILMS, VOLUME: 451
IN MY: ResearcherID
48
TITLE: Microstructural characterization and properties of a glass and a glass-ceramic made from municipal incinerator bottom ash
AUTHORS: Alendouro, MSJG; Monteiro, RCC ; Figueirdo, CFML; Martins, RMS; Silva, RJC ; Ferro, MC; Fernandes, MHV;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
AUTHORS: Alendouro, MSJG; Monteiro, RCC ; Figueirdo, CFML; Martins, RMS; Silva, RJC ; Ferro, MC; Fernandes, MHV;
PUBLISHED: 2004, SOURCE: 2nd International Materials Symposium in ADVANCED MATERIALS FORUM II, VOLUME: 455-456
INDEXED IN: Scopus WOS
IN MY: ResearcherID
49
TITLE: Effect of the discharge frequency and impedance on the structural properties of polymorphous silicon Full Text
AUTHORS: Águas, H; Raniero, L; Pereira, L; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
AUTHORS: Águas, H; Raniero, L; Pereira, L; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
INDEXED IN: CrossRef
50
TITLE: TUNNELING IN VERTICAL MU-C-SI/A-SIXCYOZ-H/MU-C-SI HETEROSTRUCTURES Full Text
AUTHORS: FORTUNATO, E ; MARTINS, R ; FERREIRA, I; SANTOS, M; MACARICO, A; GUIMARAES, L;
PUBLISHED: 1989, SOURCE: JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 115, ISSUE: 1-3
AUTHORS: FORTUNATO, E ; MARTINS, R ; FERREIRA, I; SANTOS, M; MACARICO, A; GUIMARAES, L;
PUBLISHED: 1989, SOURCE: JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 115, ISSUE: 1-3
INDEXED IN: WOS