Eduardo Jorge da Costa Alves
AuthID: R-000-4EK
291
TITLE: Single phase a-plane MgZnO epilayers for UV optoelectronics: substitutional behaviour of Mg at large contents Full Text
AUTHORS: Redondo-Cubero, A; Hierro, A; J.-M Chauveau; Lorenz, K; Tabares, G; Franco, N; Alves, E; Muñoz, E;
PUBLISHED: 2012, SOURCE: CrystEngComm, VOLUME: 14, ISSUE: 5
AUTHORS: Redondo-Cubero, A; Hierro, A; J.-M Chauveau; Lorenz, K; Tabares, G; Franco, N; Alves, E; Muñoz, E;
PUBLISHED: 2012, SOURCE: CrystEngComm, VOLUME: 14, ISSUE: 5
292
TITLE: Ion beams as a tool for the characterization of near-pseudomorphic CdZnO epilayers
AUTHORS: Redondo-Cubero, A; Brandt, M; Henneberger, F; Alves, E; Lorenz, K;
PUBLISHED: 2012, SOURCE: Oxide-based Materials and Devices III
AUTHORS: Redondo-Cubero, A; Brandt, M; Henneberger, F; Alves, E; Lorenz, K;
PUBLISHED: 2012, SOURCE: Oxide-based Materials and Devices III
293
TITLE: The influence of bed roughness on the dynamics of gravity currents
AUTHORS: Nogueira, HIS; Adduce, C; Alves, E; Franca, MJ;
PUBLISHED: 2012, SOURCE: 6th International Conference on Fluvial Hydraulics (River Flow) in RIVER FLOW 2012, VOLS 1 AND 2
AUTHORS: Nogueira, HIS; Adduce, C; Alves, E; Franca, MJ;
PUBLISHED: 2012, SOURCE: 6th International Conference on Fluvial Hydraulics (River Flow) in RIVER FLOW 2012, VOLS 1 AND 2
INDEXED IN: 
WOS
WOS294
TITLE: THE NEW EC TECHNICAL RECOMMENDATIONS FOR MONITORING INDIVIDUALS OCCUPATIONALLY EXPOSED TO EXTERNAL RADIATION
AUTHORS: Alves, JG; Ambrosi, P; Bartlett, DT; Currivan, L; van Dijk, JWE; Fantuzzi, E; Kamenopoulou, V;
PUBLISHED: 2011, SOURCE: RADIATION PROTECTION DOSIMETRY, VOLUME: 144, ISSUE: 1-4
AUTHORS: Alves, JG; Ambrosi, P; Bartlett, DT; Currivan, L; van Dijk, JWE; Fantuzzi, E; Kamenopoulou, V;
PUBLISHED: 2011, SOURCE: RADIATION PROTECTION DOSIMETRY, VOLUME: 144, ISSUE: 1-4
295
TITLE: PRELIMINARY ASSESSMENT OF THE DOSE TO THE INTERVENTIONAL RADIOLOGIST IN FLUORO-CT-GUIDED PROCEDURES
AUTHORS: Pereira, MF; Alves, JG; Sarmento, S; Santos, JAM ; Sousa, MJ; Gouvea, M; Oliveira, AD; Cardoso, JV; Santos, LM;
PUBLISHED: 2011, SOURCE: RADIATION PROTECTION DOSIMETRY, VOLUME: 144, ISSUE: 1-4
AUTHORS: Pereira, MF; Alves, JG; Sarmento, S; Santos, JAM ; Sousa, MJ; Gouvea, M; Oliveira, AD; Cardoso, JV; Santos, LM;
PUBLISHED: 2011, SOURCE: RADIATION PROTECTION DOSIMETRY, VOLUME: 144, ISSUE: 1-4
296
TITLE: Electroless Plating of Au, Pt, or Ru Thin Film Layer on CdZnTe
AUTHORS: Zheng, Q; Dierre, F; Corregidor, V; Crocco, J; Bensalah, H; Plaza, JL; Alves, E; Dieguez, E;
PUBLISHED: 2011, SOURCE: IEEE Nuclear Science Symposium/Medical Imaging Conference (NSS/MIC)/18th International Workshop on Room-Temperature Semiconductor X-Ray and Gamma-Ray Detectors in 2011 IEEE NUCLEAR SCIENCE SYMPOSIUM AND MEDICAL IMAGING CONFERENCE (NSS/MIC)
AUTHORS: Zheng, Q; Dierre, F; Corregidor, V; Crocco, J; Bensalah, H; Plaza, JL; Alves, E; Dieguez, E;
PUBLISHED: 2011, SOURCE: IEEE Nuclear Science Symposium/Medical Imaging Conference (NSS/MIC)/18th International Workshop on Room-Temperature Semiconductor X-Ray and Gamma-Ray Detectors in 2011 IEEE NUCLEAR SCIENCE SYMPOSIUM AND MEDICAL IMAGING CONFERENCE (NSS/MIC)
INDEXED IN: WOS
WOS297
TITLE: The photoluminescence/excitation (PL/E) spectroscopy of Eu-implanted GaN Full Text
AUTHORS: K.P O’Donnell; I.S Roqan; Ke Wang; Lorenz, K; Alves, E; Boćkowski, M;
PUBLISHED: 2011, SOURCE: Optical Materials, VOLUME: 33, ISSUE: 7
AUTHORS: K.P O’Donnell; I.S Roqan; Ke Wang; Lorenz, K; Alves, E; Boćkowski, M;
PUBLISHED: 2011, SOURCE: Optical Materials, VOLUME: 33, ISSUE: 7
298
TITLE: Optimization Of A Mass Spectrometry Process
AUTHORS: José Lopes ; Corre^a C Alegria; Luís Redondo; Barradas, NP; Alves, E; Jorge Rocha; Floyd D McDaniel; Barney L Doyle;
PUBLISHED: 2011
AUTHORS: José Lopes ; Corre^a C Alegria; Luís Redondo; Barradas, NP; Alves, E; Jorge Rocha; Floyd D McDaniel; Barney L Doyle;
PUBLISHED: 2011
299
TITLE: <title>Radiation damage formation and annealing in GaN and ZnO</title>
AUTHORS: Lorenz, K; Peres, M; Franco, N; Marques, JG; Miranda, SMC; Magalhães, S; Monteiro, T; Wesch, W; Alves, E; Wendler, E;
PUBLISHED: 2011, SOURCE: Oxide-based Materials and Devices II
AUTHORS: Lorenz, K; Peres, M; Franco, N; Marques, JG; Miranda, SMC; Magalhães, S; Monteiro, T; Wesch, W; Alves, E; Wendler, E;
PUBLISHED: 2011, SOURCE: Oxide-based Materials and Devices II
300
TITLE: <title>Optical properties of AlN<formula><inf><roman>x</roman></inf></formula>O<formula><inf><roman>y</roman></inf></formula> thin films deposited by DC magnetron sputtering</title>
AUTHORS: Borges, J; Alves, E; Vaz, F; Marques, L;
PUBLISHED: 2011, SOURCE: International Conference on Applications of Optics and Photonics
AUTHORS: Borges, J; Alves, E; Vaz, F; Marques, L;
PUBLISHED: 2011, SOURCE: International Conference on Applications of Optics and Photonics
