Elvira Maria Correia Fortunato
AuthID: R-000-4M5
501
TITLE: New Steps to Improve a-Si:H Device Stability by Design of the Interfaces Full Text
AUTHORS: Martins, R; Ferreira, I; Cabrita, A; Águas, H; Silva, V; Fortunato, E;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials - Adv. Eng. Mater., VOLUME: 3, ISSUE: 3
AUTHORS: Martins, R; Ferreira, I; Cabrita, A; Águas, H; Silva, V; Fortunato, E;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials - Adv. Eng. Mater., VOLUME: 3, ISSUE: 3
502
TITLE: Application of Amorphous Silicon Thin-Film Position-Sensitive Detector to Optical Rules Full Text
AUTHORS: Martins, R; Teodoro, P; Soares, F; Ferreira, I; Guimarães, N; Fortunato, E; Borges, J; José, G; Groth, A; Schultze, L; Berndt, D; Reichel, F; Stam, F;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials - Adv. Eng. Mater., VOLUME: 3, ISSUE: 3
AUTHORS: Martins, R; Teodoro, P; Soares, F; Ferreira, I; Guimarães, N; Fortunato, E; Borges, J; José, G; Groth, A; Schultze, L; Berndt, D; Reichel, F; Stam, F;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials - Adv. Eng. Mater., VOLUME: 3, ISSUE: 3
503
TITLE: Role of ion bombardment on the properties of a-Si:H films Full Text
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
504
TITLE: Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO2 thin films Full Text
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
505
TITLE: Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
506
TITLE: Plasma diagnostics of a PECVD system using different R.F. electrode configurations Full Text
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
507
TITLE: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films Full Text
AUTHORS: águas H.; Silva V.; Ferreira I.; Fortunato E.; Martins R.;
PUBLISHED: 2000, SOURCE: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
AUTHORS: águas H.; Silva V.; Ferreira I.; Fortunato E.; Martins R.;
PUBLISHED: 2000, SOURCE: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
508
TITLE: Thin Film Position Sensitive Detectors: From 1D to 3D Applications
AUTHORS: Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2000, SOURCE: Technology and Applications of Amorphous Silicon - Springer Series in Materials Science
AUTHORS: Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2000, SOURCE: Technology and Applications of Amorphous Silicon - Springer Series in Materials Science
509
TITLE: Influence of the Electrical and Structural Properties of Tin Oxide on the Performances of Combustible Gas Sensors
AUTHORS: Andreia M Lopes; Patricia Nunes; Paula Vilarinho; Regina Monteiro; Elvira Fortunato; Rodrigo Martins;
PUBLISHED: 2000, SOURCE: Functional Materials
AUTHORS: Andreia M Lopes; Patricia Nunes; Paula Vilarinho; Regina Monteiro; Elvira Fortunato; Rodrigo Martins;
PUBLISHED: 2000, SOURCE: Functional Materials
510
TITLE: New metallurgical systems for electronic soldering applications Full Text
AUTHORS: Gonçalves, C; Ferreira, J; Fortunato, E; Ferreira, I; Martins, R; A.P Marvão; J.I Martins; Harder, T; Oppelt, R;
PUBLISHED: 1999, SOURCE: Sensors and Actuators A: Physical, VOLUME: 74, ISSUE: 1-3
AUTHORS: Gonçalves, C; Ferreira, J; Fortunato, E; Ferreira, I; Martins, R; A.P Marvão; J.I Martins; Harder, T; Oppelt, R;
PUBLISHED: 1999, SOURCE: Sensors and Actuators A: Physical, VOLUME: 74, ISSUE: 1-3
