Naian A. Liu
AuthID: R-00F-M55
11
TITLE: A water-induced high-k yttrium oxide dielectric for fully-solution-processed oxide thin-film transistors Full Text
AUTHORS: Ao Liu; Guoxia X Liu; Huihui H Zhu; You Meng; Huijun J Song; Byoungchul Shin; Elvira Fortunato; Rodrigo Martins; Fukai Shan;
PUBLISHED: 2015, SOURCE: CURRENT APPLIED PHYSICS, VOLUME: 15
AUTHORS: Ao Liu; Guoxia X Liu; Huihui H Zhu; You Meng; Huijun J Song; Byoungchul Shin; Elvira Fortunato; Rodrigo Martins; Fukai Shan;
PUBLISHED: 2015, SOURCE: CURRENT APPLIED PHYSICS, VOLUME: 15
12
TITLE: Eco-friendly water-induced aluminum oxide dielectrics and their application in a hybrid metal oxide/polymer TFT
AUTHORS: Ao Liu; Guoxia X Liu; Huihui H Zhu; Byoungchul C Shin; Elvira Fortunato; Rodrigo Martins; Fukai K Shan;
PUBLISHED: 2015, SOURCE: RSC ADVANCES, VOLUME: 5, ISSUE: 105
AUTHORS: Ao Liu; Guoxia X Liu; Huihui H Zhu; Byoungchul C Shin; Elvira Fortunato; Rodrigo Martins; Fukai K Shan;
PUBLISHED: 2015, SOURCE: RSC ADVANCES, VOLUME: 5, ISSUE: 105
13
TITLE: Fully Solution-Processed Low-Voltage Aqueous In2O3 Thin-Film Transistors Using an Ultrathin ZrOx Dielectric
AUTHORS: Ao Liu; Guo Xia Liu; Hui Hui Zhu; Feng Xu; Elvira Fortunato; Rodrigo Martins; Fu Kai Shan;
PUBLISHED: 2014, SOURCE: ACS APPLIED MATERIALS & INTERFACES, VOLUME: 6, ISSUE: 20
AUTHORS: Ao Liu; Guo Xia Liu; Hui Hui Zhu; Feng Xu; Elvira Fortunato; Rodrigo Martins; Fu Kai Shan;
PUBLISHED: 2014, SOURCE: ACS APPLIED MATERIALS & INTERFACES, VOLUME: 6, ISSUE: 20
