151
TITLE: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films  Full Text
AUTHORS: águas H.; Silva V.; Ferreira I.; Fortunato E.; Martins R.;
PUBLISHED: 2000, SOURCE: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
INDEXED IN: Scopus CrossRef
IN MY: ORCID
152
TITLE: Performances of nano/amorphous silicon films produced by hot wire plasma assisted technique
AUTHORS: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F ; Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXED IN: WOS
153
TITLE: Influence of the H-2 dilution and filament temperature on the properties of P doped silicon carbide thin films produced by hot-wire technique
AUTHORS: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F; Fortunato, E; Cenimat, RM;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXED IN: WOS
Page 16 of 16. Total results: 153.