Performances of Hafnium Oxide Produced by Radio Frequency Sputtering for Gate Dielectric Application

AuthID
 P-000-9YZ
7
Author(s)
Nedev, N
·
Georgiev, S
·
1
Editor(s)
Dimoulas A.Fompeyrine J.Fanciulli M.Alexe M.Os H.J.
Document Type
Article
Year published
2004
Published
in MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, ISSN: 0921-5107
Volume: 109, Issue: 1-3, Pages: 89-93 (5)
Conference
Symposium on Functional Metal Oxides - Semiconductor Structures Held at the E-Mrs 2003 Meeting, Date: JUN 10-13, 2003, Location: Strasbourg, FRANCE, Sponsors: European Mat Res Soc
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Publication Identifiers
SCOPUS: 2-s2.0-2342450573
Wos: WOS:000221657000020
Source Identifiers
ISSN: 0921-5107
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