Publications

Effect of the Deposition Rate on Ito Thin Film Properties Prepared by Ion Beam Assisted Deposition (Ibad) Technique

AuthID
P-003-5F7

Author(s)

Meng, LJ

Teixeira, V

dos Santos, MP

Document Type

Article

Year published

2010

Published

in PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, ISSN: 1862-6300

Volume: 207, Issue: 7, Pages: 1538-1542 (5)

Conference

Symposium on Advances in Transparent Electronics Held at the 2009 Emrs Spring Meeting, Date: JUN 08-12, 2009, Location: Strasbourg, FRANCE, Sponsors: European Mat Res Soc

Indexing

Wos^®

Scopus^®

Crossref^®

Google Scholar^®

Metadata
Sources

Publication Identifiers

DOI: 10.1002/pssa.200983704

Scopus: 2-s2.0-77955609144

Wos: WOS:000280719200003

Source Identifiers

ISSN: 1862-6300

Export Publication Metadata

Marked List

Add to Marked List

Info

At this moment we don't have any links to full text documens.

Effect of the Deposition Rate on Ito Thin Film Properties Prepared by Ion Beam Assisted Deposition (Ibad) Technique

Useful Links

Get Help

Federated Authentication (Click on the image)

Effect of the Deposition Rate on Ito Thin Film Properties Prepared by Ion Beam Assisted Deposition (Ibad) Technique

Useful Links

Get Help