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Influence of Deposition Pressure on N-Doped Zno Films by Rf Magnetron Sputtering
AuthID
P-003-7YN
8
Author(s)
Wang, JZ
·
Elamurugu, E
·
Franco, N
·
Alves, E
·
Botelho do Rego, AMB
·
Goncalves, G
·
Martins, R
·
Fortunato, E
Document Type
Article
Year published
2010
Published
in
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY,
ISSN: 1533-4880
Volume: 10, Issue: 4, Pages: 2674-2678 (5)
Conference
2Nd International Conference on Advanced Nano Materials,
Date:
2008,
Location:
Aveiro, PORTUGAL,
Host:
Univ Aveiro
Indexing
Wos
®
Scopus
®
Crossref
®
Google Scholar
®
Metadata
Sources
Publication Identifiers
DOI
:
10.1166/jnn.2010.1401
SCOPUS
: 2-s2.0-77954993809
Wos
: WOS:000273984900062
Source Identifiers
ISSN
: 1533-4880
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