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Stability of Indium-Oxide Thin-Film Transistors by Reactive Ion Beam Assisted Deposition

AuthID
P-003-FMY

Author(s)

Vygranenko, Y

Wang, K

Chaji, R

Vieira, M

Robertson, J

Nathan, A

Document Type

Article

Year published

2009

Published

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 517, Issue: 23, Pages: 6341-6344 (4)

Conference

6Th Symposium on Thin Films for Large Area Electronics Held at the E-Mrs Spring Meeting, Date: MAY 26-30, 2008, Location: Strasbourg, FRANCE, Sponsors: E-MRS

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Publication Identifiers

DOI: 10.1016/j.tsf.2009.02.108

SCOPUS: 2-s2.0-68349096402

Wos: WOS:000269930400031

Source Identifiers

ISSN: 0040-6090

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Stability of Indium-Oxide Thin-Film Transistors by Reactive Ion Beam Assisted Deposition

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