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Batch Processing Method to Deposit A-Si : H Films by Pecvd
AuthID
P-000-C1S
6
Author(s)
Raniero, L
·
Aguas, H
·
Pereira, L
·
Fortunato, E
·
Ferreira, I
·
Martins, R
4
Editor(s)
Martins, R; Fortunato, E; Ferreira, I; Dias, C
Document Type
Article
Year published
2004
Published
in
ADVANCED MATERIALS FORUM II
in
Materials Science Forum,
ISSN: 0255-5476
Volume: 455-456, Pages: 104-107 (4)
Conference
2Nd International Materials Symposium,
Date:
APR 14-16, 2003,
Location:
Caparica, PORTUGAL,
Sponsors:
Portuguese Mat Soc, Portuguese Sci Fdn, Calouste Gulbenkian Fdn, Luso Amer Fdn,
Host:
New Univ Lisbon, Fac Sci & Technol
Indexing
Wos
®
Scopus
®
Metadata
Sources
Publication Identifiers
SCOPUS
: 2-s2.0-3142754892
Wos
: WOS:000222018500022
Source Identifiers
ISSN
: 0255-5476
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