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Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

AuthID
P-000-C1V

Author(s)

Pereira, L

Raniero, L

Editor(s)

Martins,R;Fortunato,E;Ferreira,I;Dias,C

Document Type

Article

Year published

2004

Published

in ADVANCED MATERIALS FORUM II in MATERIALS SCIENCE FORUM, ISSN: 0255-5476

Volume: 455-456, Pages: 112-115 (4)

Conference

2Nd International Materials Symposium, Date: APR 14-16, 2003, Location: Caparica, PORTUGAL, Sponsors: Portuguese Mat Soc, Portuguese Sci Fdn, Calouste Gulbenkian Fdn, Luso Amer Fdn, Host: New Univ Lisbon, Fac Sci & Technol

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Publication Identifiers

DOI: 10.4028/www.scientific.net/msf.455-456.112

SCOPUS: 2-s2.0-3142707953

Wos: WOS:000222018500024

Source Identifiers

ISSN: 0255-5476

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Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

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