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Silicon Effect on the Hardness of R.f. Sputtered B-C:si Amorphous Films
AuthID
P-003-RPC
4
Author(s)
Louro, C
·
Oliveira, JC
·
Chhowalla, M
·
Cavaleiro, A
Document Type
Article
Year published
2009
Published
in
PLASMA PROCESSES AND POLYMERS,
ISSN: 1612-8850
Volume: 6, Issue: SUPPL. 1, Pages: S141-S145 (5)
Conference
11Th International Conference on Plasma Surface Engineering,
Date:
SEP 15-19, 2008,
Location:
Garmisch Partenkirchen, GERMANY,
Sponsors:
European Joint Comm Plasma & Ion Surface Engn
Indexing
Wos
®
Scopus
®
Crossref
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Metadata
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Publication Identifiers
DOI
:
10.1002/ppap.200930415
SCOPUS
: 2-s2.0-77954894204
Wos
: WOS:000272302900029
Source Identifiers
ISSN
: 1612-8850
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