Calculation of Pore Size Distributions in Low-K Films

AuthID
P-007-GCQ
6
Author(s)
6
Editor(s)
Seiler, DG; Diebold, AC; McDonald, R; Ayre, CR; Khosla, RP; Secula, EM
Document Type
Proceedings Paper
Year published
2005
Published
in Characterization and Metrology for ULSI Technology 2005 in AIP CONFERENCE PROCEEDINGS, ISSN: 0094-243X
Volume: 788, Pages: 517-521 (5)
Conference
5Th Conference on Characterization and Metrology for Ulsi Technology, Date: MAR 15-18, 2005, Location: Richardson, TX, Sponsors: Natl Inst Stand & Technol, SEMATECH, Amer Phys Soc, Natl Sci Fdn, Semiconductor Res Corp, Semiconductor Equipment & Mat Int, Univ Texas Dallas, Semiconductor Int
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Publication Identifiers
SCOPUS: 2-s2.0-33749658197
Wos: WOS:000233588000081
Source Identifiers
ISSN: 0094-243X
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