Doping of Amorphous and Microcrystalline Silicon Films Deposited at Low Substrate Temperatures by Hot-Wire Chemical Vapor Deposition

AuthID
 P-000-TFK
3
Author(s)
·
Document Type
Article
Year published
2001
Published
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 19, Issue: 5, Pages: 2328-2334 (7)
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Publication Identifiers
SCOPUS: 2-s2.0-0035440997
Wos: WOS:000171376700046
Source Identifiers
ISSN: 0734-2101
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