Optoelectronic Properties Of Hydrogenated Amorphous-Silicon Films Deposited Under Negative Substrate Bias

AuthID
 P-008-XMY
7
Author(s)
CABARROCAS, PRI
·
MORIN, P
·
LIU, JZ
·
PARK, HR
·
WAGNER, S
Document Type
Article
Year published
1991
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 69, Issue: 5, Pages: 2942-2950 (9)
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Publication Identifiers
SCOPUS: 2-s2.0-0001737275
Wos: WOS:A1991FA70500026
Source Identifiers
ISSN: 0021-8979
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