Role of the Deposition Parameters in the Uniformity of Films Produced by the Plasma-Enhanced Chemical Vapour Deposition Technique

AuthID
 P-001-AV8
5
Author(s)
Macarico, A
·
Fidalgo, J
·
Document Type
Article
Year published
1997
Published
in PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, ISSN: 0141-8637
Volume: 76, Issue: 3, Pages: 259-272 (14)
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Publication Identifiers
SCOPUS: 2-s2.0-0342478341
Wos: WOS:A1997XU82700003
Source Identifiers
ISSN: 0141-8637
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