Hydrogen Incorporation In Silicon-Oxide Films Deposited By Arf Laser-Induced Chemical-Vapor-Deposition

AuthID
P-001-GPS
8
Author(s)
PARADA, EG
·
GONZALEZ, P
·
SERRA, J
·
LEON, B
·
PEREZAMOR, M
·
DASILVA, MF
·
SOARES, JC
Document Type
Article
Year published
1995
Published
in JOURNAL OF NON-CRYSTALLINE SOLIDS, ISSN: 0022-3093
Volume: 187, Pages: 75-80 (6)
Indexing
Publication Identifiers
Wos: WOS:A1995RK19500013
Source Identifiers
ISSN: 0022-3093
Export Publication Metadata
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