Effect of Oxygen Partial Pressure on the Electrical and Optical Properties of Highly (200) Oriented P-Type Ni1-Xo Films by Dc Sputtering

AuthID
 P-00F-TA2
4
Author(s)
Saha, B
·
Mitra, MK
·
Chattopadhyay, KK
Document Type
Article
Year published
2007
Published
in JOURNAL OF MATERIALS SCIENCE, ISSN: 0022-2461
Volume: 42, Issue: 14, Pages: 5766-5772 (7)
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Publication Identifiers
SCOPUS: 2-s2.0-34547368249
Wos: WOS:000247943600068
Source Identifiers
ISSN: 0022-2461
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