Nucleation and Growth of Ti2Aln Thin Films Deposited by Reactive Magnetron Sputtering onto Mgo(111)

AuthID
P-00F-TGR
6
Author(s)
Beckers, M
·
Muecklich, A
·
Moeller, W
·
Hultman, L
Document Type
Article
Year published
2007
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 102, Issue: 7, Pages: 074916 (8)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-35348922269
Wos: WOS:000250147700161
Source Identifiers
ISSN: 0021-8979
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