Structure Dependent Resistivity and Dielectric Characteristics of Tantalum Oxynitride Thin Films Produced by Magnetron Sputtering

AuthID
 P-00G-QG9
12
Author(s)
Cristea, D
·
Crisan, A
·
Ion, V
·
Dinescu, M
·
Apreutesei, M
·
Munteanu, D
Document Type
Article
Year published
2015
Published
in APPLIED SURFACE SCIENCE, ISSN: 0169-4332
Volume: 354, Pages: 298-305 (8)
Indexing
Wos®
Scopus®
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Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-84944275748
Wos: WOS:000363673500009
Source Identifiers
ISSN: 0169-4332
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