Influence of the Process Parameters on Structural and Electrical Properties of R.f. Magnetron Sputtering Ito Films

AuthID
 P-00H-FAW
5
Author(s)
Baía, I
·
Fernandes, B
·
Nunes, P
·
Quintela, M
·
Document Type
Article
Year published
2001
Published
in Thin Solid Films, ISSN: 0040-6090
Volume: 383, Issue: 1-2, Pages: 244-247
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ISSN: 0040-6090
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