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Origin Of Gas Impurities In Sputtering Plasmas During Thin-Film Deposition
AuthID
P-001-R9M
1
Author(s)
ANDRITSCHKY, M
Document Type
Article
Year published
1991
Published
in
VACUUM,
ISSN: 0042-207X
Volume: 42, Issue: 12, Pages: 753-756 (4)
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Publication Identifiers
DOI
:
10.1016/0042-207x(91)90173-g
SCOPUS
: 2-s2.0-0025890895
Wos
: WOS:A1991FP64600007
Source Identifiers
ISSN
: 0042-207X
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