Deposition of Amorphous Silicon Using a Tubular Reactor with Concentric-Electrode Confinement

AuthID
 P-00H-MC5
5
Author(s)
Chan, KK
·
Blum, JM
·
Arienzo, M
·
Cuomo, JJ
Document Type
Article
Year published
1992
Published
in J. Appl. Phys. - Journal of Applied Physics, ISSN: 0021-8979
Volume: 71, Issue: 8, Pages: 3981
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ISSN: 0021-8979
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