Low Filament Temperature Deposition of A-Si:h by Hot-Wire Chemical Vapor Deposition

AuthID
 P-00H-MDF
4
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Document Type
Article
Year published
1995
Published
in J. Appl. Phys. - Journal of Applied Physics, ISSN: 0021-8979
Volume: 78, Issue: 6, Pages: 3776
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ISSN: 0021-8979
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