Large Area Deposition of Polymorphous Silicon by Plasma Enhanced Chemical Vapor Deposition at 27.12 Mhz and 13.56 Mhz

AuthID
P-00H-YR8
8
Author(s)
Águas, H
·
Silva, V
·
Lebib, S
·
Roca i Cabarrocas, P
·
Ferreira, I
·
Guimarães, L
·
Document Type
Article
Year published
2003
Published
in Jpn. J. Appl. Phys. - Japanese Journal of Applied Physics, ISSN: 0021-4922
Volume: 42, Issue: Part 1, No. 8, Pages: 4935-4942
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ISSN: 0021-4922
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