Evidence For Sif62-Ions In Electrochemically Deposited Si-O-F Films And Plasma-Enhanced Chemically Vapor-Deposited Si-O-H-F Alloys

AuthID
 P-001-SHV
2
Author(s)
PIMENTA, G
·
Document Type
Letter
Year published
1989
Published
in JOURNAL OF PHYSICS-CONDENSED MATTER, ISSN: 0953-8984
Volume: 1, Issue: 26, Pages: 4263-4266 (4)
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Publication Identifiers
SCOPUS: 2-s2.0-36149031279
Wos: WOS:A1989AE39300021
Source Identifiers
ISSN: 0953-8984
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