Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

AuthID
 P-00J-5QV
3
Author(s)
Document Type
Article
Year published
2006
Published
in Materials Science Forum - MSF, ISSN: 1662-9752
Volume: 514-516, Pages: 475-482
Indexing
Crossref®
Google Scholar®
Publication Identifiers
Source Identifiers
ISSN: 1662-9752
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

footer slogan

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service