Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

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 P-00J-5QV
3
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Article
Year published
2006
Published
in Materials Science Forum - MSF, ISSN: 1662-9752
Volume: 514-516, Pages: 475-482
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ISSN: 1662-9752
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