Improved Thermoelectric Properties of Nanocrystalline Hydrogenated Silicon Thin Films by Post-Deposition Thermal Annealing

AuthID
 P-00N-3BR
9
Author(s)
Mateus, T
·
Filonovich, S
·
Ferreira, M
·
Figueira, J
·
Rodrigues, A
·
Donovan, BF
·
Hopkins, PE
·
Document Type
Article
Year published
2017
Published
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 642, Pages: 276-280 (5)
Indexing
Wos®
Scopus®
Crossref®13
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-85030312475
Wos: WOS:000413807200039
Source Identifiers
ISSN: 0040-6090
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