Etchability Dependence of Inox and Ito Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions

AuthID
 P-00N-T0V
7
Author(s)
de Carvalho, CN
·
Document Type
Article
Year published
2018
Published
in MRS ADVANCES, ISSN: 2059-8521
Volume: 3, Issue: 4, Pages: 207-212 (6)
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Scopus®
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Handle®
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Publication Identifiers
SCOPUS: 2-s2.0-85044181883
Wos: WOS:000427823300004
Source Identifiers
ISSN: 2059-8521
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