Magnetic Reversal and Thermal Stability of Cofeb Perpendicular Magnetic Tunnel Junction Arrays Patterned by Block Copolymer Lithography

AuthID
 P-00N-YMG
9
Author(s)
Tu, KH
·
Fernandez, E
·
Almasi, H
·
Wang, WG
·
Ntetsikas, K
·
Moschovas, D
·
Avgeropoulos, A
·
Ross, CA
Document Type
Article
Year published
2018
Published
in NANOTECHNOLOGY, ISSN: 0957-4484
Volume: 29, Issue: 27, Pages: 275302 (12)
Indexing
Wos®
Scopus®
Crossref®3
Pubmed®
Google Scholar®
Publication Identifiers
Pubmed: 29633719
Scopus: 2-s2.0-85048235525
Wos: WOS:000431777100002
Source Identifiers
ISSN: 0957-4484
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