Effect of Hot-Filament Annealing in a Hydrogen Atmosphere on the Electrical and Structural Properties of Nb-Doped Tio2 Sputtered Thin Films

AuthID
P-002-DSQ
14
Author(s)
Document Type
Article
Year published
2012
Published
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 520, Issue: 7, Pages: 2514-2519 (6)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-84856390740
Wos: WOS:000301085100022
Source Identifiers
ISSN: 0040-6090
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