Effect of Heat Treatment on Electrical and Surface Properties of Tungsten Oxide Thin Films Grown by Hfcvd Technique

AuthID
 P-00S-WPV
6
Author(s)
Tan, GL
·
Tang, D
·
Dastan, D
·
Jafari, A
·
Document Type
Article
Year published
2021
Published
in MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, ISSN: 1369-8001
Volume: 122
Indexing
Wos®
Scopus®
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-85092493566
Wos: WOS:000600424700004
Source Identifiers
ISSN: 1369-8001
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