Influence of the Deposition Conditions on the Properties of Titanium Oxide Produced by R.f. Magnetron Sputtering

AuthID
P-000-993
Document Type
Article
Year published
2004
Published
in MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, ISSN: 1369-8001
Volume: 7, Issue: 4-6, Pages: 243-247 (5)
Conference
Symposium on New Materials in Future Silicon Technology Held at the E-Mar 2004 Spring Meeting, Date: 2004, Location: Strasbourg, FRANCE
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Publication Identifiers
SCOPUS: 2-s2.0-9544232544
Wos: WOS:000225855200015
Source Identifiers
ISSN: 1369-8001
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