Can We Rationally Design and Operate Spatial Atomic Layer Deposition Systems for Steering the Growth Regime of Thin Films?

AuthID
 P-00Y-EHF
10
Author(s)
Vale, JP
·
Sekkat, A
·
Gheorghin, T
·
Sevim, S
·
Mavromanolaki, E
·
Flouris, AD
·
Pane, S
·
Munoz-Rojas, D
·
Puigmarti-Luis, J
·
Document Type
Article in Press
Year published
2023
Published
in JOURNAL OF PHYSICAL CHEMISTRY C, ISSN: 1932-7447
Volume: 127, Issue: 19, Pages: 9425-9436 (12)
Indexing
Wos®
Scopus®
Crossref®2
Pubmed®
Google Scholar®
Publication Identifiers
Pubmed: 37223651
SCOPUS: 2-s2.0-85159596138
Wos: WOS:000984392700001
Source Identifiers
ISSN: 1932-7447
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service