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Influence of Sputtering Power and the Substrate-Target Distance on the Properties of Zro2 Films Prepared by Rf Reactive Sputtering

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P-000-YDR

Author(s)

Gao, PT

Tipo de Documento

Article

Year published

2000

Publicado

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 377, Páginas: 557-561 (5)

Conference

27Th International Conference on Metallurgical Coatings and Thin Films, Date: APR 10-14, 2000, Location: SAN DIEGO, CALIFORNIA, Patrocinadores: Amer Vacuum Soc, Adv Surface Engn Div

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Publication Identifiers

DOI: 10.1016/s0040-6090(00)01291-8

SCOPUS: 2-s2.0-0034502867

Wos: WOS:000166024600094

Source Identifiers

ISSN: 0040-6090

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Influence of Sputtering Power and the Substrate-Target Distance on the Properties of Zro2 Films Prepared by Rf Reactive Sputtering

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Influence of Sputtering Power and the Substrate-Target Distance on the Properties of Zro2 Films Prepared by Rf Reactive Sputtering

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