Publications

Progress on High-Voltage Pulse Generators, Using Low Voltage Semiconductors (< 1 Kv), Designed for Plasma Immersion Ion Implantation (Piii)

AuthID
P-000-NYC

Author(s)

Redondo, LM

Pinhao, N

Margato, E

Silva, JF

Document Type

Article

Year published

2002

Published

in SURFACE & COATINGS TECHNOLOGY, ISSN: 0257-8972

Volume: 156, Issue: 1-3, Pages: 61-65 (5)

Conference

6Th International Workshop on Plasma-Based Ion Implantation (Pbii-2001), Date: JUN 25-28, 2001, Location: GRENOBLE, FRANCE, Sponsors: CNRS, Univ Joseph Fourier, Inst Natl Polytechn Grenoble, European Commiss, Minist Affaires Etrangeres, Minist Educ Natl, Minist Defense/DGA, City Grenoble, Reg Rhone Alpes, Grenoble Alps METROPOLE

Indexing