Influence of Hydrogen Gas Dilution on the Properties of Silicon-Doped Thin Films Prepared by the Hot-Wire Plasma-Assisted Technique

AuthID
 P-000-QS5
5
Author(s)
1
Editor(s)
Vieira, T
Document Type
Article
Year published
2002
Published
in ADVANCED MATERIALS FORUM I in Key Engineering Materials, ISSN: 1013-9826
Volume: 230-2, Pages: 591-594 (4)
Conference
1St International Materials Symposium (Materials 2001), Date: APR 09-11, 2001, Location: COIMBRA, PORTUGAL, Sponsors: Portuguese Soc Mat, Host: UNIV COIMBRA
Indexing
Wos®
Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-0036434960
Wos: WOS:000179553200137
Source Identifiers
ISSN: 1013-9826
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