Publications

Influence of Sputtering Power and the Substrate-Target Distance on the Properties of Zro2 Films Prepared by Rf Reactive Sputtering

AuthID
P-000-YDR

Author(s)

Gao, PT

Document Type

Article

Year published

2000

Published

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 377, Pages: 557-561 (5)

Conference

27Th International Conference on Metallurgical Coatings and Thin Films, Date: APR 10-14, 2000, Location: SAN DIEGO, CALIFORNIA, Sponsors: Amer Vacuum Soc, Adv Surface Engn Div

Indexing

Wos^®

Scopus^®

Crossref^®

Google Scholar^®

Metadata
Sources

Publication Identifiers

DOI: 10.1016/s0040-6090(00)01291-8

Scopus: 2-s2.0-0034502867

Wos: WOS:000166024600094

Source Identifiers

ISSN: 0040-6090

Export Publication Metadata

Marked List

Add to Marked List

Info

At this moment we don't have any links to full text documens.

Influence of Sputtering Power and the Substrate-Target Distance on the Properties of Zro2 Films Prepared by Rf Reactive Sputtering

Useful Links

Get Help

Federated Authentication (Click on the image)

Influence of Sputtering Power and the Substrate-Target Distance on the Properties of Zro2 Films Prepared by Rf Reactive Sputtering

Useful Links

Get Help