Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of A-Si : H Thin Films

AuthID
 P-001-218
5
Author(s)
Maneira, M
·
4
Editor(s)
Martins,R;Ferreira,I;Fortunato,E;Kroesen,G
Document Type
Article
Year published
2000
Published
in PLASMA PROCESSING AND DUSTY PARTICLES in MATERIALS SCIENCE FORUM, ISSN: 0255-5476
Volume: 382, Pages: 11-20 (10)
Conference
5Th European Workshop on Dusty and Colloidal Plasmas, Date: JUN 03-05, 2000, Location: COSTA DA CAPARICA, PORTUGAL, Sponsors: New Univ Lisbon, Fac Sci Technol, UNINOVA, Minist Sci & Technol Portugal, Fdn Cience & Technol, Caloust Gulbenkian Fdn, Luso Amer Fdn Dev, N Atlantic Treat Org, NATO Sci Stabil
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Scopus®
Publication Identifiers
SCOPUS: 2-s2.0-0035682789
Wos: WOS:000174579900002
Source Identifiers
ISSN: 0255-5476
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