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Silicon Oxycarbide Microcrystalline Layers Produced by Spatial Separation Techniques
AuthID
P-001-KJ4
4
Author(s)
MARTINS, R
·
FERREIRA, I
·
FORTUNATO, E
·
VIEIRA, M
5
Editor(s)
Schiff, EA; Hack, M; Madan, A; Powell, M; Matsuda, A
Document Type
Proceedings Paper
Year published
1994
Published
in
AMORPHOUS SILICON TECHNOLOGY-1994
in
Materials Research Society Symposium Proceedings,
ISSN: 0272-9172
Volume: 336, Pages: 55-60 (6)
Conference
Symposium on Amorphous Silicon Technology, at the 1994 Mrs Spring Meeting,
Date:
APR 04-08, 1994,
Location:
SAN FRANCISCO, CA,
Sponsors:
MAT RES SOC
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Wos
®
Scopus
®
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Publication Identifiers
SCOPUS
: 2-s2.0-84897585030
Wos
: WOS:A1994BC30G00009
Source Identifiers
ISSN
: 0272-9172
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