Mechanical and Piezoresistive Properties of Thin Silicon Films Deposited by Plasma-Enhanced Chemical Vapor Deposition and Hot-Wire Chemical Vapor Deposition at Low Substrate Temperatures

AuthID
 P-002-7YZ
6
Author(s)
Gualdino, A
·
Lemke, B
·
Paul, O
·
·
Document Type
Article
Year published
2012
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 112, Issue: 2, Pages: 024906 (8)
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Publication Identifiers
SCOPUS: 2-s2.0-84865513846
Wos: WOS:000308424500143
Source Identifiers
ISSN: 0021-8979
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