In Situ Study of the Growth Properties of Ni-Rare Earth Silicides for Interlayer and Alloy Systems on Si(100)

AuthID
P-002-D0H
10
Author(s)
Knaepen, W
·
Smeets, D
·
Schrauwen, A
·
Comrie, CM
·
Detavernier, C
·
Temst, K
·
Vantomme, A
Document Type
Article
Year published
2012
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 111, Issue: 4, Pages: 043511 (13)
Indexing
Publication Identifiers
SCOPUS: 2-s2.0-84857857859
Wos: WOS:000300948600028
Source Identifiers
ISSN: 0021-8979
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