Influence of O-2 Partial Pressure on the Growth of Nanostructured Anatase Phase Tio2 Thin Films Prepared by Dc Reactive Magnetron Sputtering

AuthID
 P-002-T8J
4
Author(s)
Maneira, MJP
·
Document Type
Article
Year published
2011
Published
in MATERIALS CHEMISTRY AND PHYSICS, ISSN: 0254-0584
Volume: 126, Issue: 1-2, Pages: 73-81 (9)
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Publication Identifiers
SCOPUS: 2-s2.0-78751630579
Wos: WOS:000287349600014
Source Identifiers
ISSN: 0254-0584
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