Ab Initio Investigation of Phosphorus and Boron Diffusion in Germanium

AuthID
P-003-VYJ
5
Author(s)
Document Type
Article
Year published
2008
Published
in MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, ISSN: 1369-8001
Volume: 11, Issue: 5-6, Pages: 324-327 (4)
Conference
International Symposium on Beyond Silicon Technology Held at the 2008 Emrs Spring Meeting, Date: MAY 26-30, 2008, Location: Strasbourg, FRANCE, Sponsors: European Mat Res Soc
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Publication Identifiers
SCOPUS: 2-s2.0-70349781259
Wos: WOS:000271700600035
Source Identifiers
ISSN: 1369-8001
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