Role of the Oxide Layer on the Performances of A-Si : H Schottky Structures Applied to Pds Fabrication

AuthID
P-004-CE1
6
Author(s)
5
Editor(s)
Wagner, S; Chu, V; Atwater, HA; Yamamoto, K; Zan, HW
Document Type
Proceedings Paper
Year published
2007
Published
in Amorphous and Polycrystalline Thin-Film Silicon Science and Technology 2006 in MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, ISSN: 0272-9172
Volume: 910, Pages: 415-420 (6)
Conference
Symposium on Amorphous and Polycrystalline Thin-Film Silicon Science and Technology Held at the 2006 Mrs Spring Meeting, Date: APR 18-21, 2006, Location: San Francisco, CA, Sponsors: Mat Res Soc
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Publication Identifiers
SCOPUS: 2-s2.0-34249931890
Wos: WOS:000245670700059
Source Identifiers
ISSN: 0272-9172
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