Influence of Substrate Properties and Annealing Temperature on the Stress State of Magnetron Sputtered Tungsten Thin Films

AuthID
 P-004-GD6
2
Author(s)
Document Type
Article
Year published
2006
Published
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, ISSN: 0734-2101
Volume: 24, Issue: 6, Pages: 2070-2075 (6)
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Publication Identifiers
SCOPUS: 2-s2.0-33750965050
Wos: WOS:000242484900014
Source Identifiers
ISSN: 0734-2101
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