In Situ Characterization of the P-Si/Nh4F Interface During Dissolution in the Current Oscillations Regime

AuthID
 P-007-825
7
Author(s)
Cattarin, S
·
Chazalviel, JN
·
Ozanam, F
·
Peter, LM
·
Stumper, J
Document Type
Article
Year published
1998
Published
in Journal of the Electrochemical Society, ISSN: 0013-4651
Volume: 145, Issue: 2, Pages: 498-502
Indexing
Scopus®
Crossref®29
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-0031996606
Source Identifiers
ISSN: 0013-4651
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service